Exceptional diamond tools for in-situ pad conditioning in metal CMP processes
Abrasive Technology is pleased to introduce a diamond conditioning disk for in-situ pad conditioning in metal CMP processes.
Product Features:
- Capable of withstanding the harsh environment of low pH metal CMP slurries.
- Successfully tested in slurries with pH levels as low as 1.5 without bond degradation.
- High wafer throughput.
- Low cost of ownership.
These metal CMP disks are available in production quantities in various shapes and sizes for all production CMP platforms.
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